The use of reliability factors in analyzing powder patterns in Pt-Si sputtering targets and subsequent films
A. Rahman, W.P. Lowe, C.W. Bates, Jr.
(Howard University)
X-ray powder diffraction was used to characterize a Pt-Si sputtering target and subsequent films. The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. The results presented for these samples corroborate with results observed for this system in the planar configuration.
Keywords: composites; crystallographic structure; thin film
Order No.: JA806-013 © 1998 MRS
Go to June 1998 Table of Contents
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