Communication
Micron thick epitaxial (100) Ag film growth on MgO
A.C. Carter, W. Chang, S.B. Qadri, J.S. Horwitz, R. Leuchtner, D.B. Chrisey
(Naval Research Laboratory)
Epitaxial films of (100) Ag were deposited onto (100) MgO substrates
to a thickness of 4 µm with no evidence of (111) nucleation. Deposited
films were smooth and had large areas, 50 x 50 microns square, free of morphological
defects. Films were deposited using a two step process. First, pulsed laser
deposition was used to grow a 1000 Å Ag (100) seed layer on the MgO
substrate. Second, e-beam evaporation was used to grow the film to the desired
thickness. The high quality of the resulting films will allow them to be
used as templates for further epitaxial deposition of other applied materials.
Keywords: metals; microstructure; thin film
Order No.: JA806-003 © 1998 MRS
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