Volume 20, No. 5 May 1995
A Publication of the Materials Research Society
IN SITU, REAL TIME CHARACTERIZATION OF THIN-FILM GROWTH
PROCESSES
- Why In-Situ, Real Time Characterization of Thin-Film
Growth Processes?, p. 14
O. Auciello and A.R. Krauss, Guest Editors - Time-of-Flight, Ion-Beam Surface Analysis for In Situ
Characterization of Thin-Film Growth Processes, p. 18
A.R. Krauss, O. Auciello, and J.A. Schultz - In Situ Ellipsometry in Microelectronics,p. 24
E.A. Irene and J.A. Woollam - Laser-Reflectance Interferometry Measurements of Diamond-Film
Growth, p. 29
C.D. Zuiker, D.M. Gruen, and A.R. Krauss - Analysis of Growing Films of Complex Oxides by RHEED, p.
32
I. Bozovic and J.N. Eckstein - Total-Reflection X-Ray Fluorescence Spectroscopy for In
Situ, Real-Time Analysis of Growing Films, p. 43
T.A. Roberts and K.E. Gray - Real-Time Monitoring of Epitaxial Processes by Parallel-Polarized
Reflectance Spectroscopy, p. 49
N. Dietz and K.J. Bachman
IUMRS
- IUMRS General Assembly Meeting Held in Taiwan, p. 58
MRS NEWS
- Journal of Materials Research Editor's Report, p.
60
ABSTRACTS
DEPARTMENTS
- Letter from the President, p. 3
- Research/Researchers, p. 5
- Washington News, p. 10
- Public Affairs Forum, p. 12
- Resources, p. 13
- Advertisers in this Issue, p. 57
- Historical Note, p. 67
- Calendar, p. 75
- Classified, p. 78
- Posterminaries, p. 80
[Information from the Table of Contents may be reproduced]
