Volume 17, No. 6 June 1992
A Publication of the Materials Research Society
ION-ASSISTED PROCESSING OF ELECTRONIC MATERIALS
- Ion-Assisted Processing of Electronic Materials, p. 23
W.L. Brown and A. Ourmazd, Guest Editors - Fundamental Concepts of Ion-Solid Interactions; Single Ions,
10 -12 Seconds, p. 26
J.A. Davies - Response of a Material: From Single Ions to Experimental
Times and Fluences, p. 30
W.L. Brown and A. Ourmazd - Status of Low-Dose Implantation for VLSI, p. 34
T.E. Seidel and L.A. Larson - Buried Oxide and Silicide Formation by High Dose Implantation
in Silicon, p. 40
Subsurface Processing of Electronic materials Assisted by Atomic Displacements, p. 47
J.S. Williams - Ion-Assisted Surface Processing of Electronic Materials,
p. 52
S.T. Picraux, E. Chason, and T.M. Mayer
INTERNATIONAL UNION OF MATERIALS RESEARCH SOCIETIES
- MRS-I Hosts Third Annual General Meeting, p. 58
- E-MRS, MatTech, f.e.m.s. Join Forces for 1992 E-MRS Fall
Meeting, p. 59
MRS NEWS
- Green, Mayo, and Shapiro Will Chair the 1993 MRS Spring Meeting,
p. 66
DEPARTMENTS
- Material Matters, p. 5
- Research/Researchers, p. 9
- From Washington, p. 19
- Resources, p. 21
- Editor's Choice, p. 22
- Advertisers in this Issue, p. 61
- University Chapter News, p. 62
- Historical Note, p. 67
- Upcoming Conferences, p. 68
- Book Reviews, p. 69
- Classified, p. 71
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