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CALL FOR LATE NEWS POSTERS Symposium E: III-Nitride, SiC, and Diamond Materials for Electronic Devices MATERIALS RESEARCH SOCIETY - SPRING MEETING 1996 San Francisco, CA April 8-12, 1996 The symposium program includes 13 invited speakers, over 130 contributed papers and a panel discussion.(see the program at www.mrs.org under "meetings") Because of the rapid developments of new research and applications involving III-N, SiC and Diamond semiconductors, we invite submission of Late News Posters for this symposium. These papers should represent significant advances that have not been widely discussed. A very limited number will be accepted and presented. The accepted Late News Posters will be displayed for a single day at the meeting. Viewing will be during morning and afternoon coffee breaks, and manuscripts will be considered for the proceedings volume. Abstracts should be prepared following the MRS Format and should be submitted by Email or FAX to Bob Nemanich (see below) prior to February 29. Abstracts will be considered as they are received. Symposium Organizers: D. Kurt Gaskill Naval Research Laboratory Washington, DC 20375-5000 Phone: 202-404-8712 Fax 202-767-4290 gaskill@estd.nrl.navy.mil Chuck Brandt Westinghouse Science &Technology Center Pittsburgh, PA 15235 Phone: 412-256-1881 Fax 4120-256-1877 cbrandt@aeslcad.pgh.wec.com Robert J. Nemanich N. C. State University Raleigh, NC 27695-8202 Phone:919-515-3225 Fax: 919-515-7331 Robert_Nemanich@ncsu.edu Symposium E: III-Nitride, SiC, and Diamond Materials for Electronic Devices Recently, extraordinary improvements in the quality of Diamond, SiC, and III-N Semiconductors have been reported. These improvements have resulted in remarkable advances in electronic materials and devices having negative electron affinity, RF power generation, long-term memory, high voltage control, etc., applications. Many of these advances take advantage of commonalities in the synthesis and fabrication of these devices. Therefore, it is of great interest to compare and contrast the effects of existing science and technology on the formation and processing of these materials to each other and to evaluate whether fundamental limits have been reached or, if not, to help develop new methods of achieving those limits. Contributed papers are solicited in the following and related areas: * Formation and properties of substrates suitable for epitaxy and/or implantation * Formation of insulating layers and the role of compensating impurities, defects, and traps * Epilayer formation and doping control, activation of dopants, compensation mechanisms, uniformity, and reproducibility; interface formation and the presence of trapped charge * Approaches to and stability of metallization at elevated temperatures * Dry and wet processing issues, novel lithographic approaches, and surface passivation * Performance of state-of-the-art electron devices and novel structures in terms of output power, stability, device lifetime; comparison of performance to device model calculations with emphasis on how material properties determine device performance (both experimental and theoretical) * Systems insertion issues: manufacturability, commercial applications, and integration of components into existing systems A four-day symposium is anticipated, and a joint session with Symposium C: Compound Semiconductor Electronics and Photonics is envisioned. Partial list of invited speakers: P.K. Bachmann (Philips GmbH); Electron Emission from CVD Diamond; J. Bernholc (North Carolina State University), GaN Native Defect Theory; S. Binari (Naval Research Laboratory, GaN RF Devices; S. Denbaars (University of California, Santa Barbara), GaN Growth and Characterization; K. Doverspike (Hewlett-Packard), GaN Film Growth; M. Ghezzo (General Electric CRD), SiC Power Devices; R. Hopkins (Westinghouse), SiC Substrate Crystal Growth; P. Pehrsson (Naval Research Laboratory), Diamond Surface Chemistry; W. Qian (Carnegie Mellon University), GaN Characterization, TEM; and L. Rea (Wright Laboratory), SiC Device DoD Applications; R. Rupp (Siemens), SiC Epitaxial Growth; R. Trew (Case Western Reserve University), Wide Bandgap Device Modeling; W. Yarborough (Pennsylvania State University), Synthesis of c-BN Yes, Tell Me How To Submit an Abstract Symposium Organizers Chuck Brandt SiC Electronics Westinghouse Science & Technology Center 1310 Beulah Rd./MS 501-2D16 Pittsburgh, PA 15235 Phone (412) 256-1881 Fax (412) 256-1877 cbrandt@aeslcad.pgh.wec.com D. Kurt Gaskill Code 6861 Chemical Deposition Section Naval Research Laboratory Washington, DC 20375-5000 Phone (202) 404-8712 Fax (202) 767-4290 gaskill@estd.nrl.navy.mil Robert J. Nemanich Departments of Physics and Materials Science North Carolina State University Raleigh, NC 27695-8202 Phone (919) 515-3225/3468 Fax (919) 515-7331 nemanich@unity.ncsu.edu
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