The Amorphous Silicon Technology Symposium brings together scientists working on amorphous silicon based device technologies and on fundamental materials issues. We call for original papers reporting on progress in deposition technologies and processes, materials characterization, device design and manufacturing issues, as well as novel applications.
Recent symposia in this series have highlighted work on:
* Deposition - remote and direct plasma deposition, chemical vapor and hot-wire deposition, sputtering, and chemical annealing
* Characterization - structure, hydrogen's role, origins of stability, defect density-of-states and relaxation, and electrical transport
* Devices - thin-film transistors, solar cells, detectors, sensors, emitters, and memories
* Applications - active-matrix liquid crystal displays and two-dimensional imaging
The symposium is planned for seven half-day sessions of oral presentations and two evening poster sessions; the number of posters will be limited to ensure a good opportunity for discussion. Note that this MRS Meeting will also be the venue for a symposium on Flat Panel Display Materials (Symposium H) and another on Thin Films for Photovoltaic and Related Device Applications (Symposium J); joint sessions of the three symposia are planned.
In addition to the formal abstract, authors are encouraged to submit an additional page of supporting text/figures.
A tutorial complementing this symposium is tentatively planned to precede the symposium. Further information will be included in the program book scheduled for mailing February 1996.
Symposium Program Committee: Ruud Schropp (Utrecht University, The Netherlands), Michael Hack (Xerox PARC); Eric Schiff (Syracuse University); Hiroaki Okamoto (Osaka University); Robert Collins (Pennsylvania State University); Yue Kuo (IBM); Isamu Shimizu (Tokyo Institute of Technology); Jerome Perrini (Ecole Polytechnique); and Martin Stutzmann (Technical University of Munich)
Yes, Tell Me How To Submit an Abstract
Symposium Organizers
Michael Hack
Xerox Palo Alto Research Center
3333 Coyote Hill Road
Palo Alto, CA 94304
Phone (415) 812-4535
Fax (415) 493-6349
hack@parc.xerox.com
Eric A. Schiff
Department of Physics
Syracuse University
Syracuse, NY 13244-1130
Phone (315) 443-3908
Fax (315) 443-9103
schiff@suhep.phy.syr.edu
Sigurd Wagner
B422 Engineering Quad
Department of Electrical Engineering
Princeton University
Princeton, NJ 08544
Phone (609) 258-4631
Fax (609) 258-4631
wagner@princeton.edu
Ruud Schropp
Atomic and Interface Physics
Debye Institute
University of Utrecht
P.O. Box 80,000
3508 TA Utrecht
The Netherlands
Phone (31) 30-533170
Fax (31) 30-543165
r.e.i.schropp@fys.ruu.nl
Akihisa Matsuda
Electrotechnical Laboratory
1-1-4 Umezono
Tsukuba-shi, Ibaraki 305
Japan
Phone (81) 298-54-5252
Fax (81) 298-58-5425
amatsuda@qm.etl.go.jp
Administrative Contact:
Mary Ann Woolf
Department of Physics/201 JFB
University of Utah
Salt Lake City, UT 84112
Phone (801) 581-4246/4801
Fax (801) 581-4246
woolf@pclab.physics.utah.edu
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