8:30 AM C1.1SESSION C1: DYNAMICS OF ADATOMS, VACANCIES AND CLUSTERS I
Chair: Jim Evans
Monday Morning, November 30, 1998
Salon C/D (M)
1:30 PM *C2.1SESSION C2: DYNAMICS AT STEP EDGES
Chair: Daniel Kandel
Monday Afternoon, November 30, 1998
Salon C/D (M)
C3.1SESSION C3: POSTER SESSION:
SEMICONDUCTORS
Monday Evening, November 30, 1998
8:00 P.M.
America Ballroom (W)
STUDY OF PHYSICAL PROPERTIES OF SILICON EMISSION DURING SILICON
OXIDATION. Hiroyuki Kageshima , Kenji Shiraishi, NTT Basic
Research Labs, Kanagawa, JAPAN.
C3.11
COMPUTATIONAL
STUDY ON SURFACE DIFFUSION AND NUCLEATION PROCESSES IN SURFACTANT
EPITAXIAL GROWTH. Hitoshi Nakahara , Ayahiko Ichimiya,
Nagoya Univ, Dept of Quantum Engineering, Nagoya, JAPAN; Masakazu
Ichikawa, Joint Research Center for Atom Technology, Angstrom
Technology Partnership, Tsukuba, JAPAN.
C3.12
THEORETICAl
MODEL OF STEP MOTION ON THE SILICON SURFACES. Grigorii V.
Gadiyak , Institute of Computational Technologies, Russian Academy of
Sciences, Siberian Division, Novosibirsk, RUSSIA.
C3.13
A MOLECULAR
DYNAMICS STUDY OF STEP MOTIONS ON VICINAL SILICON SURFACES.
A.M.Mazzone , C.N.R.-LAMEL, Bologna,
ITALY.
C3.14
HYDROGEN-INDUCED
ATOMIC MOTION DURING THE INITIAL STAGE OF THIN FILM GROWTH.
Kenjiro Oura , Masaru Kubo, Toshiaki Fujino, Mitsuhiro
Katayama, Osaka Univ., Dept of Electronic Engineering, Suita, Osaka,
JAPAN; Victor G. Lifshits, Alexander A. Saranin, Andrey V. Zotov,
Inst of Automation and Control Processes, Vladivostok,
RUSSIA.
C3.15
COADSORPTION
ON SILICON SURFACE AND SURFACE PHASES FORMATION. Yury Gavriljuk,
Alexander Saranin, Victor Lifshits , Inst of Automation &
Control Processes, Russian Academy of Sciences, Vladivostok, RUSSIA;
Andrew Zotov, Vladivostok Univ, Vladivostok, RUSSIA; Sergey Azatyan,
Far East State Univ, Vladivostok, RUSSIA.
C3.16
A STUDY OF THE
SURFACE RECONSTRUCTION OF
(100). A.V.
Mijiritskii , M.H. Langelaar, D.O. Boerma.
C3.17
THERMODYNAMICS
AND KINETICS OF THE TISI2 PHASES VIA TIGHT BINDING MOLECULAR
DYNAMICS. M.Iannuzzi , INFM and University of Milano,
ITALY; M. Celino, ENEA, Roma, ITALY; Leo Miglio INFM and University
of Milano, ITALY.
C3.18
GROWTH
KINETICS OF
-FeSi and
-FeSi2. M.
Fanciulli and G. Weyer, Institute of Physics and Astronomy, Aarhus
University, Aarhus C, DENMARK; A. Zenkevich, Moscow Engineering
Physics Institute, Moskow, RUSSIA.
C3.19
IN-SITU
MONITORING OF InP ATOMIC LAYER EPITAXY IN METAL-ORGANIC CHEMICAL
VAPOR DEPOSITION BY SURFACE PHOTO-ABSORPTION. Tae-Wan
Lee , Heedon Hwang, Youngboo Moon, Euijoon Yoon, Seoul National
University, School of Materials Science & Engineering, Seoul, KOREA;
Young Dong Kim, Kyung Hee University, Dept of Physics, Seoul,
KOREA.
C3.20
EFFECT OF
INTERFACE ROUGHNESS AND GROWTH TEMPERATURE ON THE ABSORPTION SPECTRUM
OF 810 NM REFLECTION MODULATOR ACTIVE LAYERS. Wendy L.
Sarney , L. Salamanca-Riba, University of Maryland, Dept. of
Materials and Nuclear Engineering, College Park, MD; John D. Bruno,
Mary S. Tobin, U.S. Army Reseach Laboratory, Adelphi,
MD.
C3.21
MATERIAL AND
SURFACE ANALYSIS OF P-TYPE JUNCTIONS IN SILICON FORMED BY RAPID
THERMAL DIFFUSION. M. Nolan , T. Perova, R.A. Moore,
Dept. of Electrical and Electronic Eng., Trinity College Dublin,
IRELAND; H.S. Gamble, Dept. of Electronic Eng., The Queen's
University of Belfast, NORTHERN IRELAND.
C3.22
MICROSTRUCTURAL
EVOLUTION NEAR THE InGaAs/GaAs STRANSKI-KRASTANOW TRANSITION.
R. Leon , Jet Propulsion Laboratory, California Institute
of Technology, 4800 Oak Grove Drive, Pasadena, CA; S. Fafard,
Institute for Microstructural Sciences, National Research Council,
Ottawa, Ontario, CANADA.
C3.23
IN-SITU
UHV TEM ANNEALING STUDIES OF Ge/Si ISLAND TRANSITIONS.
William L. Henstrom , Peter D. Miller, J. Murray Gibson,
Univ of Illinois at Urbana/Champaign, Dept of Physics, Urbana,
IL.
C3.24
INVESTIGATION
OF INTERFACE AND SURFACE SMOOTHNESS AND DEFECT FORMATION IN SiC/Si
FILMS GROWN WITH Ge. Wendy L. Sarney , L. Salamanca-Riba,
University of Maryland, Dept. of Materials & Nuclear Engineering,
College Park, MD; P. Zhou, M. Spencer, Howard University, Materials
Science Research Center of Excellence, Washington, D.C.; R.P. Sharma,
R.D. Vispute, T. Venkatesan, Center for Superconductivity, University
of Maryland, College Park, MD; K. Jones, U.S. Army Research
Laboratory, Adelphi, MD.
C3.25
SIMULATION OF
SURFACE MORPHOLOGY EVOLUTION IN SILICON GROWTH FROM SILANE.
Maurizio Masi , Carlo Cavallotti, Valeria Bertani and
Sergio Carra', Dipartimento di Chimica Fisica Applicata, Politecnico
di Milano, Milano, ITALY.
C3.26
IN-SITU
SYNCHROTRON X-RAY SCATTERING STUDY OF SURFACE AND INTERFACIAL
BEHAVIOR DURING THE CRYSTALLIZATION OF a-Si:H FILMS. H.J.
Kim , S.H. Jeon, D.Y. Noh, K-JIST, Dept of Materials Science and
Engineering, Kwangju, KOREA.
C3.27
EFFECT OF Mo
AND MoSix INTERLAYERS ON C54 TiSi2 FORMATION.
Shun-ichiro Ohmi , and Raymond T. Tung, Lucent
Technologies, Bell Laboratories, Murray Hill, NJ.
C3.28
SURFACE
MORPHOLOGY AND STRUCTURE OF InP AND InGaAs FILMS GROWN BY
METALORGANIC VAPOR-PHASE EPITAXY. L. Li , B.-K. Han, Q.
Fu, M. Begarney, D. Law and R.F. Hicks, Chemical Engineering
Department, University of California, Los Angeles,
CA.
C3.29
THEORETICAL
INVESTIGATION OF THE INITIAL OXIDATION OF Si (001) AND THE BAND
ALIGNMENT AT THE Si/SiO2 INTERFACE. A. Demkov ,
Predictive Engineering Laboratory, Motorola, Inc, Mesa, AZ; O.F.
Sankey, Department of Physics, Arizona State University, Tempe,
AZ.
C3.30
THE MORPHOLOGY
OF INCLUSIONS IN RUTILE NANOPARTICLES. Shirley Turner,
Surface and Microanalysis Science Division, Chemical Science and
Technology Laboratory, National Institute of Standards and
Technology, Gaithersburg, MD.
C3.31
HRTEM
CHARACTERIZATION OF STRAIN RELAXATION IN LOW TEMPERATURE ATOMIC LAYER
EPITAXY OF INP/INAS/INP HETEROSTRUCTURES. H.H.Kang ,
L.Salamanca-Riba, Department of Materials and Nuclear Engineering,
University of Maryland at College Park, College Park, MD ;
M.Beaudoin, L.Isnard, R.A.Maust, GCM and Departement de Genie
Physique, Ecole Polytechnique de Montreal, Montreal, Quebec,
CANADA.
C3.32
CONTROL OF
MINORITY CARRIER RECOMBINATION THROUGH UHV ATOMIC SCALE SURFACE
MODIFICATION. Paul G. Evans , Div. of Eng. and Appl.
Sciences, Harvard Univ.; Stephen A. McDonald, Rowland Inst. for
Science; Jene A. Golovchenko, Div of Eng. and Appl. Sciences, Harvard
Univ, Cambridge, MA.
C3.33
INTERFACIAL
REACTIONS IN THE FLIP CHIP SOLDER CR/CU/AU - PBSN METALLIZATION
SYSTEM. R. Esser and A. Christou, Department of
Materials and Nuclear Engineering, University of Maryland, College
Park, MD.
C3.34
REAL-TIME
ELASTIC LIGHT SCATTERING MEASUREMENTS OF III-V SURFACE STRUCTURE
EVOLUTION DURING MBE GROWTH. T. Pinnington , M. Adamcyk,
A. Ballestad, Y. Levy, J.A. MacKenzie, T. Tiedje, Advanced Materials
and Process Engineering Laboratory, University of British Columbia,
Vancouver, BC, CANADA.
C3.35
ION-BEAM-INDUCED
EPITAXIAL CRYSTALLIZATION OF DIAMOND USING ENERGETIC IONS UP TO 400
keV. M. Ogura , M. Hasegawa, Y. Tanaka and N. Kobayashi,
Quantum Radiation Division, Electrotechnical Laboratory, Tsukuba,
JAPAN.
C3.36
EFFECT OF
SURFACE CARBON AND WET CHEMICAL ETCHING ON THE SURFACE MORPHOLOGY OF
LOW-MISCUT (100) SRTIO3 SINGLE-CRYSTAL SUBSTRATES.
Andrew D. Polli , Thomas Wagner, Manfred Rühle,
Max-Planck-Institut für Metallforschung, Stuttgart,
GERMANY.
8:30 AM C4.1SESSION C4: ALLOYS
Chair: Flemming Besenbacher
Tuesday Morning, December 1, 1998
Salon C/D (M)
1:30 PM C5.1SESSION C5: MORPHOLOGY EVOLUTION
Chair: Jian Shen
Tuesday Afternoon, December 1, 1998
Salon C/D (M)
8:30 AM C6.1SESSION C6: ELECTRONIC GROWTH AND ELECTROMIGRATION
Chair: Margret Giesen
Wednesday Morning, December 2, 1998
Salon C/D (M)
1:30 PM *C7.1SESSION C7: DYNAMICS OF ADATOMS, VACANCIES AND CLUSTERS II
Chairs: James B. Hannon and Harald Ibach
Wednesday Afternoon, December 2, 1998
Salon C/D (M)
C8.1SESSION C8: POSTER SESSION:
METALS AND CERAMICS
Wednesday Evening, December 2, 1998
8:00 P.M.
America Ballroom (W)
8:30 AM C9.1SESSION C9: INITIAL GROWTH
Chair: Karina Morgenstern
Thursday Morning, December 3, 1998
Salon C/D (M)
1:30 PM C10.1SESSION C10: THEORY
Chairs: Matthias Scheffler and Ellen D. Williams
Thursday Afternoon, December 3, 1998
Salon C/D (M)
The following exhibitors have identified their products and services as directly related to your research:
Accurel Systems/Materials Analysis Group
Andeen-Hagerling, Inc.
Australian Scientific Instruments
Bede Scientific Incorporated
Burleigh Instruments, Inc.
Cameca Instruments, Inc.
Ceramaseal
Digital Instruments, Inc.
Evans East
EXAKT Technologies, Inc.
Hinds Instruments, Inc.
Huntington Mechanical Laboratories, Inc.
Hysitron Incorporated
Janis Research Company, Inc.
JEOL USA, Inc.
k-Space Associates, Inc.
Kimbal Physics, Inc.
KLA-Tencor Corporation
Kratos Analytical Inc.
LEO Electron Microscopy Inc.
Micro Photonics Inc.
MMR Technologies, Inc.
Molecular Imaging
Molecular Metrology, Inc.
Molecular Simulations, Inc.
National Electrostatics Corporation
NFT-Nanofilm Technologie GmbH
Nicolet Instrument Corporation
NORAN Instruments, Inc.
Olympus America Inc.
Omicron Associates
Osmic, Inc.
Oxford Instruments America, Inc./Research Instruments Division
Physical Electronics
Princeton Instruments, Inc.
Quesant Instrument Corporation
Renishaw Inc.
RHK Technology, Inc.
Rigaku/USA, Inc.
Scintag Inc.
Silicon Sense, Inc.
SPECS USA, Inc.
SPI Supplies/Structure Probe, Inc.
STAIB Instruments, Inc.
SVT Associates, Inc.
Thermionics Vacuum Products
TPL, Inc.
Varian Vacuum Products
Virginia Semiconductor, Inc.
J.A. Woollam Co., Inc.
X-Ray Optical Systems, Inc.
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See page 7 for a complete list of exhibitors.