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2003
MRS Fall Meeting MRS Symposium M: Nontraditional Approaches to Patterning The ability to pattern materials into well-defined structures plays an important role in many areas that include physics, chemistry, biology, and engineering. For example, structures with critical dimensions on the nanoscale have been shown to exhibit interesting, and potentially useful, new phenomena that include quantized excitation or emission, Coulomb blockade, single electron tunneling, metal-insulator transition, and superparamagnetism. Microscale structures, on the other hand, have been widely explored for use in fabricating electronic devices, photonic components, display units, sensors, MEMS, and lab-on-chip systems. In all these applications, patterning represents the first and one of the most significant challenges to their realization. Although nanostructures on the scale of tens of nm can be conveniently generated using several advanced nanolithographic techniques (e.g., deep UV photolithography and e-beam writing), the development of these methods into practical routes to large numbers of nanostructures rapidly and at low cost still requires great ingenuity. Nontraditional approaches (e.g., the so-called bottom-up method and soft lithography) seem to provide a more promising strategy for the formation of patterned structures in terms of cost, throughput, and potential for large-scale production. This symposium will focus on nontraditional methods for patterning on both nano- and microscales. Specific topics of this symposium will include, but not be limited to, ·
Unconventional approaches to patterning (e.g., soft lithography, embossing,
dip-pen lithography, scanning probe lithography, and template-directed
patterning) Invited speakers include: J. Aizenberg (Lucent Technologies), I. Aksay (Princeton Univ.), P. Alivisatos (Univ. of California-Berkeley), P. Braun (Univ. of Illinois, Urbana-Champaign), T.J. Bunning (Air Force Research Lab), F. Chi (Univ. of Munster, Germany), E. Delamarche (IBM, Zurich, Switzerland), W. Huck (Cambridge Univ.), P. Hammond (Massachusetts Inst. of Technology), J. Jacobson (Massachusetts Inst. of Technology), C. Lieber (Harvard Univ.), C. Mirkin (Northwestern Univ.), M. Mrksich (Univ. of Chicago), C. Murphy (Univ. of South Carolina), P. Nealey (Univ. of Wisconsin-Madison), R.G. Nuzzo (Univ. of Illinois, Urbana-Champaign), C. Ober (Cornell Univ.), G. Ozin (Univ. of Toronto, Canada), R. Penner (Univ. of California-Irvine), J. Perry (Univ. of Arizona), P. Prasad (SUNY-Buffalo), J.A. Rogers (Lucent Technologies), A. Stein (Univ. of Minnesota), E.L. Thomas (Massachusetts Inst. of Technology), O. Velev (North Carolina State Univ.), G.M. Whitesides (Harvard Univ.), and P. Yang (Univ. of California-Berkeley). Symposium Organizers Younan
Xia Charles
D. E. Lakeman Jie
Liu Shu
Yang
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